JMAR,
JMAR Awarded Additional $7.5 Million under Two Year Contract Extension by NAVAIR for X-ray Mask Program
Thursday June 30, 8:30 am ET
Company Granted $3.6 Million Funding to Continue Work Under Expanded Contract
SAN DIEGO--(BUSINESS WIRE)--June 30, 2005--The US Government's Naval Air Warfare Center (NAVAIR), under DARPA sponsorship, granted JMAR Technologies, Inc. (NASDAQ:JMAR - News) a two-year extension valued at $7,580,000 to its existing three-year $10 million contract to continue development of sub-100nm feature X-ray masks for next generation lithography and production of Zone Plate optics for X-ray Microscopes and X-Ray Nano Probes. NAVAIR has also released $3.6 million of funding to support continuing work under this contract.
Under this contract, JMAR will use its patented, advanced X-ray lithography stepper technology and newly developed X-ray masks to demonstrate fabrication of high-density CRAM integrated circuits with 35-50nm contact holes enabling 4 Mb and higher densities for high-priority military and space applications. The X-ray masks developed through this program will also be used to produce the X-ray optical elements known as Zone Plates, which collect and focus X-rays and are key components of X-ray Microscopes and X-ray Nano Probe tools.
"This contract extension enables JMAR to continue advancing X-ray lithography mask infrastructure and to apply its unique X-ray lithography technology to the development of a fast, cost-effective means of producing state-of-the-art Zone Plates for both defense and commercial applications," said Ronald A. Walrod, President and Chief Executive Officer of JMAR. "The on-going development of X-ray source technology through this new NAVAIR funding helps to expand the utility of our platform technology beyond X-ray lithography and into important nanotechnology and biotech applications - including the illumination for X-ray microscopy and nano-scale chemical analysis." |
