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Technology Stocks : General Lithography

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To: Andrew Vance who wrote (1290)	12/17/2001 9:05:06 AM
From: Katherine Derbyshire	Read Replies (1) of 1305

As I understand it, the UTEK 157 nm platform is a small field development system, not a production tool. If they're working on a production tool, they wouldn't admit it when I talked to them a few months ago. ASML is certainly working on a 157 nm system, but I think they'd be reluctant to describe it as "ready." The advantage of the SVG lens design was that it uses significantly less calcium fluoride, and can tolerate less optically perfect material. Both of which are good things, because as of right now no one is making calcium fluoride that meets the specs for 157 nm systems with conventional refractive optics. Katherine

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