Cymer Taps One of World's Top Lithography Experts
from Hewlett-Packard to Lead New Division
Nigel Farrar Appointed Director of Lithography Applications
SAN DIEGO, Calif., October 11, 1999?Cymer, Inc. (Nasdaq NM: CYMI), the world's leading supplier of illumination sources essential for deep ultraviolet (DUV) photolithography, today announced that it has appointed one of the semiconductor industry's leading lithography experts, Dr. Nigel Farrar, formerly of Hewlett-Packard, Palo Alto, Calif., to serve as director of lithography applications - a new department created to expand Cymer's understanding of the critical factors involved in the lithography process.
In his new role, Farrar will lead Cymer's efforts to better understand chipmaker requirements which are essential for Cymer to develop and deliver cost-effective, value-added light source solutions. As part of this effort, Farrar will work closely with Cymer's four wavelength product development teams to ensure that the company's current and next-generation light source solutions coincide with semiconductor industry roadmaps.
Commenting on Farrar's appointment, Dr. Richard Sandstrom, vice president and chief technical officer for Cymer, noted, "With more than 15 years of experience in advanced lithography and process development, Nigel brings a unique perspective to our strong team of laser and semiconductor equipment experts. In fact, Cymer employs over half of the world's top experts in microlithography laser light source technology - signaling our efforts to continuously strengthen our leadership position in this dynamic market."
Sandstrom added, "Nigel's extensive background as an end-user of lithographic equipment will be instrumental in helping Cymer augment its understanding of customers' next-generation lithography requirements well into the next century. Key to this effort, Nigel will work closely with customers worldwide to ensure that our existing and next-generation light sources deliver the superior resolution capabilities and reliable performance necessary for device geometries to move below the sub-quarter micron threshold."
Prior to joining Cymer, Farrar spent 15 years at Hewlett Packard, most recently serving as a project scientist for the company's ultra large scale integration (ULSI) laboratory. In this role, he was responsible for developing the advanced lithography technology strategy for both equipment and processes within the lab. This included the evaluation and selection of DUV lithography equipment and materials for HP's advanced integrated circuit process development. Prior to this, Farrar served as a process engineer for HP's ICBD technology development center. In this role, he led a team which introduced DUV lithography within HP's wafer fabrication facilities for the production of devices with 0.25 micron design rules. Before joining HP in 1984, Farrar was a member of the technical staff for Raychem Corp., in Menlo Park, Calif.
Farrar earned a bachelor's degree in physics and a Ph.D. in physics of materials from the University of Bristol, England. He has authored numerous papers on DUV lithography and holds several patents in the areas of materials science. Farrar is a member and periodic speaker/conference chair for several industry association-sponsored lithography conferences and workshops.
Cymer, Inc. is the leading provider of excimer laser illumination sources, the essential light source for deep ultraviolet (DUV) photolithography systems. DUV lithography is a key enabling technology, which has allowed the semiconductor industry to meet the exact specifications and manufacturing requirements for volume production of today's advanced semiconductor chips. Further information on Cymer may be obtained from the company's SEC filings, on the Internet at
cymer.com |
