From the "Editor's Choice" at Katherine?s site:
Production Laser The ELS-6010 is Cymer?s latest KrF excimer laser for lithography providing advanced optical performance applicable to 130 nm semiconductor manufacturing
New at Semicon Europa
semiconductoronline.com{BEB8CE6F-1560-11D4-8C37-009027DE0829}
The ELS-6010 is Cymer?s latest KrF excimer laser for lithography providing advanced optical performance applicable to 130 nm semiconductor manufacturing. The ELS-6010 offers a narrow bandwidth and enable full imaging performance from lithography stepper and scanners using lenses with numerical apertures .0.70. At 20 watts output power, the ELS-6010 supports the highest throughput lithography systems available today. Operating at 2500 Hz, the ELS-6010 delivers 25% more pulses in a single exposure compared to 2000 Hz systems, which improves dose stability at the wafer for improved CD control and higher yield.
The ELS-6010 can also cut annual pulse consumption with its Variable Energy and Repetition Rate Operation feature, which allows the laser to be optimized per exposure conditions and provide only the exact amount of power needed to expose the wafer.
Cymer, Inc., 16750 Via Del Campo Ct., San Diego, CA 92127-1712, Tel: 858-385-7300, Fax: 858-385-6009
By: Cymer, Inc. |
