Carl Zeiss to Deliver Advanced Optics to International SEMATECH and Extreme Ultraviolet -- EUV -- LLC; Supports Future Generation Lithography Research
MUNICH, Germany--(BUSINESS WIRE)--May 19, 2000--International SEMATECH, Carl Zeiss and the EUV LLC (Extreme Ultraviolet Limited Liability Company) today announced a program to demonstrate advanced optics for EUV Lithography. Carl Zeiss is the optics partner of ASM Lithography. ASM Lithography is helping to develop extreme ultraviolet lithography tools in cooperation with the EUV LLC.
The optics will be used to create a small field, two-mirror, high Numerical Aperture (NA) camera at the EUV Virtual National Laboratory. These optics will be used for laboratory demonstrations of the scalability of EUV technology to 0.03 microns (30 nanometers) and below.
International SEMATECH is funding the EUV LLC to contract with Carl Zeiss for the delivery of these optics. Carl Zeiss will deliver the optics to the EUV LLC and the Virtual National Laboratory in the second quarter of 2000.
The EUV LLC and the Virtual National Laboratory will conduct tests and evaluations on the optics. Successful completion of these evaluations demonstrates the capability needed to manufacture optics for future EUV production tools and provides the EUV LLC and Virtual National Laboratory with the optics to demonstrate the multigenerational viability of the EUV Lithography.
About International SEMATECH
International SEMATECH is a non-profit research and development consortium of semiconductor manufacturing companies, including AMD, Conexant, Hewlett-Packard, Hyundai, Infineon Technologies, Intel, IBM, Lucent Technologies, Motorola, Philips, STMicroelectronics, TSMC, and Texas Instruments. Additional information is available at www.sematech.org.
About the EUV LLC
The EUV LLC is a private industry consortium, led by Intel Corporation, Advanced Micro Devices, and Motorola. In partnership with the Virtual National Laboratory (VNL) -- consisting of three U.S. Department of Energy labs -- the EUV LLC is developing Extreme Ultra Violet lithography for commercial manufacturing of computer chips. EUV is an advanced lithography technology that will allow the industry to etch circuit lines smaller than 0.1-micron widths. This new technology will allow microprocessors to become 100 times more powerful and memory chips to store 1,000 times more information than is currently possible.
About Carl Zeiss
Carl Zeiss is an innovative technology leader in the fields of optics and precision engineering. Its products include eyeglasses, binoculars, medical systems for microsurgery, microscopes as well as metrology tools for the automotive industry. The Semiconductor Technology business group develops and produces leading edge lithography systems for wafer steppers as well as inspection microscopes for defect classification (up to 300mm wafers), mask simulation and inspection tools working at deep UV and 193nm wavelengths. The product spectrum extends from high resolution stand alone microscopes to high tech review and inspection systems with automatic defect classification software (ADC). With the mask simulation systems MSM 100 (for the wavelengths 436 nm, 365 nm and 248 nm) and MSM 193 (for the wavelength 193 nm), Carl Zeiss produces unique microscope systems which make it possible to check the relevance of mask defects for the photolithography process. Further information on Carl Zeiss may be obtained from the Internet at zeiss.de or by contacting the company directly.
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CONTACT:
EUV LLC - Intel
Howard High, 408/765-1488
howard.i.high@intel.com
or
International SEMATECH
Jess Blackburn, 512/356-3118
Jess.Blackburn@SEMATECH.Org
or
Carl Zeiss
Hans Hinrich Doelle, (49) 736-420-3242
doelle@zeiss.de |
