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From: <staff@quote.com>
Date: Thu, 27 Feb 1997 15:15:29 -0800 (PST)
To: quotecom-users@quote.com
Subject: SDL Announces Favorable Decision in Patent Infringement Action
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Rockwell MOCVD Patent Declared Invalid by Court of Federal Claims
SAN JOSE, Calif., Feb. 27 /PRNewswire/ -- SDL, Inc. (Nasdaq: SDLI)
announced today that on February 5, 1997, the Court of Federal Claims in
Washington, D.C., granted summary judgment in favor of SDL, declaring invalid
key portions of a Rockwell (NYSE: ROK) patent for a metal organic chemical
vapor deposition ("MOCVD") process used in the manufacture of optoelectronic
devices. Rockwell had claimed that SDL manufacturing processes used in the
fabrication of SDL's semiconductor laser products infringed the Rockwell MOCVD
patent. Rockwell had sought damages and an injunction against SDL's further
use of the process. Commenting on the court's decision, Donald R. Scifres,
Chairman and Chief Executive Officer of SDL noted, "We are heartened by this
important decision because we have believed all along that the Rockwell patent
was invalid." Scifres added, "Although Rockwell has asked the court for a
reconsideration of certain issues and may appeal the decision, we believe the
ultimate resolution of this matter will eliminate any obligation of SDL to pay
license fees to Rockwell relating to MOCVD processes." |
