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To: barb loucks who wrote (34844)10/11/1997 12:20:00 PM
From: Yousef   of 186894
 
Barb,

Re: "Paul, I thought I read a post you wrote on DUV and Cymer ..."

Here is a post that I sent regarding Cymer:

siliconinvestor.com

And here is one from Paul:

siliconinvestor.com

In regards to X-ray, optical lithography (DUV) uses a 4X or 5X reduction
from the reticle/mask to the wafer. X-ray system require that the mask
have the same dimensions (1X) as features on the wafer. Thus, X-ray
masks are very difficult and expensive to make. This mask issue has
kept X-ray from being a serious contender for many years.

Yousef
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