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Politics : Formerly About Advanced Micro Devices

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To: Kenith Lee who wrote (58408)	5/17/1999 4:33:00 AM
From: Process Boy	of 1577191

Kenith - <As I had explained to Yousef, there is no quantum leap in process technologies. Gates are routinely shrunk to get performance.> This is of course true. <While that is done, it lays the path for the next process shrink. One can not go from 0.22um to 0.13um in a flash. It takes many small steps.> I know this. I do this for a living. But unfortunately, you are making leaps in your logic that ostensibly make sense, but in the detail are not accurate. Just because the .18 guys may be shrinking gates to 150nm, doesn't mean they call up their .25 buddies and say "Hey, we did it. Here's how you do it". Doesn't work that way. As you said, incremental steps are taken over time that are specific to the current process generation worked on, not by borrowing from the next generation. There's most likely different tool sets, topographical considerations, gate ox scaling to be done in conjunction, etc. <Remember that 0.18um is still DUV. Wait and see when 193 is massively used. You may be looking at under 100nm gate soon.> Already seen 'em. Not on .18 however. :-). PB

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