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Technology Stocks : JMAR Technologies(JMAR)
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To: James Bowser who wrote ()8/7/1999 6:43:00 PM
From: real_time99   of 9695
 
Here's an interesting press release from IBM and Photronics regarding their establishment of a center to advance the development of photomasks for all Next Generation Lithography technologies:

photronics.com This is from Photronics Website)

This sounds positive from the standpoint of JMAR's x-ray source development project, at least from the standpoint of crossing some of the hurdles that all of the NGL technologies have to cross. As we know, all of the NGL technologies have to solve and develop issues beyond just making a workable light source. They also have to make sure that 1) masks are developed that work with their specific NGL technology, 2) photoresists that get exposed on the chips are developed for that NGL, and 3) various lens/reflective/focusing means are solved. A lot of this will boil down not just to whether all these pieces will work, but the costs of each of these things. I understand from what I read that the cost of the optics to extend optical litho to the point they are talking is extremely prohibitive. Clearly a lot is riding on JMAR (and the others) developing their workable source before the other NGLs work out all of their mask, resist and optics issues. Based on IBM's substantial work in the area of x-ray lithography using synchrotrons, as well as the other non-lithography work that has been done and is being done by scientists all over the world using synchrotrons, it is my understanding that most of these related processes have been moved along farther for x-ray lithography than for EUV or the other NGL technologies. I have to believe that this joint activity involving IBM will result in further advances in the mask area for x-ray litho, even if it also helps solve some issues for the non-x-ray litho technologies.
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