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Technology Stocks : Trikon Technologies - TRKN

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To: Robert Henry who wrote ()5/8/2000 5:49:00 PM
From: bob zagorin   of 926
 
Trikon Technologies Approved for Listing On NASDAQ National Market

NEWPORT, Wales, United Kingdom--(BUSINESS WIRE)--May 8, 2000-- Trikon Technologies, Inc. (OTC BB: TRKN) a technology leader in semiconductor production equipment today announced that the common stock of the company had been approved for listing on the Nasdaq national market under the symbol TRKN and will commence trading on Wednesday, May 10, 2000.

"Trikon's management team are dedicated to creating shareholder value by developing and supplying leading edge production equipment to the semiconductor industry," said Nigel Wheeler, president and chief executive officer. "Trikon equipment is used worldwide to make semiconductors for computers, communications and consumer products such as memory, wireless devices and image sensors. These are products that are changing the way the world works and thinks. We are proud of our role and performance in this industry and hope that this listing will improve the public profile of Trikon and marketability of the company's common stock."

In addition to a broad range of equipment offering productivity and cost of ownership advantages, Trikon has developed advanced products including a unique patented low-k deposition cluster tool, the Low K Flowfill(TM), metalization barrier deposition and M0RI(TM) high density plasma etch. These products continue to gain market acceptance and are expected to generate continued sales growth in the rapidly expanding market.

The Company is scheduled to release its first quarter 2000 results before markets open tomorrow, Tuesday, May 9th.

Trikon have recently made announcements including:

-- LSI Logic reported using Low-K Flowfill in G12(TM)(0.18 micron

drawn) provides a 36 percent performance improvement over

standard k material

-- Repeat orders from TriQuint for PVD and plasma etch equipment

for GaAs processing

-- Leading North American communications company orders 8 plasma

etch and plasma CVD systems for optoelectronics device

manufacture

-- Exchange of bonds and preferred notes for common stock

reducing dividend payable in fiscal 2000 by $1.1m and reducing

interest payable by $72,000

-- Tower Semiconductor Ltd. order additional Flowfill(R) and

Forcefill(R) systems for production expansion

Trikon's new technology products include:

Low K Flowfill(TM). An advanced low-k dielectric deposition system capable of both gap fill and planarization enabling the low-k advantage of increased device speed to be brought to existing aluminum metalization devices as well as copper.

Sigma(R) fxP(TM) PVD. A metalization system offering high throughput and reliability with advanced process modules for high uniformity PVD, metal plug (Forcefill(R)) and advanced barrier deposition processes including ionized PVD. M0RI(TM) Omega(R). An advanced high-density plasma etch chamber on a small footprint platform.

About Trikon Technologies

Trikon, www.trikon.com has patents and patents pending on Flowfill(R) and Low K Flowfill(TM) and related processes and continues to develop low-k chemistries and processes for advanced applications. Trikon provides a broad line of advanced manufacturing systems used for three of the major processing steps in the manufacture of a semiconductor device: chemical vapor deposition (CVD), physical vapor deposition (PVD) and plasma etch. Products include: Low K Flowfill(TM) for advanced low-k insulator deposition, Sigma(R) fxP for advanced metal deposition including barrier layers and M0RI(TM) high-density plasma etchers.
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