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Technology Stocks : Dupont Photomasks (DPMI)
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To: Duane L. Olson who wrote (861)6/13/1999 11:00:00 PM
From: Katherine Derbyshire  Read Replies (1) of 955
 
The rapid move to 0.13 micron is very good for the 193 nm laser folks. 248 nm can work at 0.18 micron if you're willing to spend enough on masks, but 0.13 micron is far tougher.

Rapid shrinks in general are also good for the 157 nm (F2) laser people. The faster the shrink to 0.10 micron or so happens, the less likely post-optical lithography is to be ready, and the more likely 157 nm will be needed as a bridge. Hence the rapid increase in interest in 157 nm in the last 6-9 months or so.

A good link for laser topics would be Photonics Online, photonicsonline.com. (shameless plug alert) That's a sister site of Semiconductor Online, edited by a friend of mine who is also the expert I turn to when I have optics questions.

In general, I'm seeing a lot of interest in low-k dielectrics, particularly the non-spin-on ones such as Applied Materials' Black Diamond material. Just as 157 nm lithography is appealing because it looks like 248 nm or i-line, Black Diamond is appealing because it looks like plasma-deposited oxide. Spin-on dielectrics are scary.

The rebirth of 300mm will also mean a big surge in interest in automation and other wafer handling issues, which are really the biggest changes required by the transition.

Katherine
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