Major Push Toward Extreme Ultraviolet
Lithography Enabled By SVG's Successful
Completion Of EUV LLC Design Review
SVG Progress Leverages Work Done By EUV Limited Liability Company and
Virtual National Laboratory
SAN JOSE, Calif.--(BUSINESS WIRE)--June 14, 1999-- Silicon Valley Group's (Nasdaq:SVGI - news)
drive toward multiple generations of extreme ultraviolet (EUV) lithography systems gained further
momentum today following completion of the April critical milestone and design review stipulated by its
partnership with the EUV Limited Liability Company (EUV LLC).
The EUV LLC is a consortium comprising Intel, Motorola and AMD. Silicon Valley Group (SVG), along
with the Virtual National Laboratory (VNL) and others, is one of the contributors to the partnership.
By successfully passing this milestone review, SVG is on track to present in September detailed
technical and business plans for a first generation EUV lithography system.
''After much industry deliberation, EUV has emerged as a viable choice for lithographic tools for 70
nm and below. Completion of this milestone is a major step in the success of the program,'' noted Noreen
Harned, SVG vice president of the EUV program. ''Our EUV tool approach provides for multiple
generations of EUV systems with risk being contained by using SVG technology for alignment,
autocalibration, focus and optics scanning. Additionally, we have leveraged work done by the VNL and
several key subcontractors for sources and material management.''
According to SVG corporate vice president John Shamaly, ''The accelerated industry technology
roadmap has put the pressure on NGL development. Our all-optical roadmap completes the technology
gap at the 100 nm node with a 157 nm product. Our EUV program is set to complete the drive toward
meeting industry requirements. Timing of our first generation EUV tools is 2003 with volume production
for circuit features at 70 nm and below expected for 2005.''
The ability to introduce EUV as the NGL technology of choice is critical to continued advances in
semiconductor technology and keeping pace with Moore's Law. Named after Gordon Moore, founder of
Intel, Moore's Law stipulates that the number of transistors per die doubles every 18 to 24 months.
Staying on track with Moore's Law requires that the semiconductor industry continue to drive
processing equipment technology, particularly innovations in photolithography equipment.
''Our progress toward the NGL lithographic solution is also emerging as an enabler of our multi-product
strategy. We fully intend to manage evolution of our new lithography cluster tool so that
commercialization of our EUV design is integrated into a true benchmark for fab productivity,''
commented SVG chairman and CEO Papken Der Torossian.
The Virtual National Laboratory comprises Lawrence Berkeley National Laboratory (LBNL), Lawrence
Livermore National Laboratory (LLNL) and Sandia National Laboratories (SNL) who work under the
auspices of the Department of Energy (DOE).
Silicon Valley Group (Nasdaq:SVGI - news) is a leading manufacturer of automated wafer processing
equipment for the worldwide semiconductor industry. The company designs, manufactures and markets
technically sophisticated equipment used in the primary stages of semiconductor chip manufacturing. Its
products include photolithography exposure tools; photoresist processing equipment; oxidation, diffusion
and low-pressure chemical vapor deposition processing systems; and precision optical components and
systems. For more information, visit www.svg.com.
Forward-looking Statement Disclaimer: The matters discussed in this news release, and in particular
those of the Company's Chairman and CEO, include forward-looking statements that involve risks
associated with the ability to timely complete and have accepted an EUV design which is timely or
cost-effective. Additional risks include but are not limited to economic conditions, industry conditions,
trade environment and other risks discussed more fully in filings by the Company with the Securities and
Exchange Commission. Reference is made to the Company's most recent Forms 10K and 10Q, which detail
such risk factors.
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