06/24 08:48 Ultratech Secures Multi-Million-Dollar Order From a Leading
European <UTEK.O>
Ultratech Secures Multi-Million-Dollar Order From a Leading European Semiconductor Manufacturer
SAN JOSE, Calif.--(BUSINESS WIRE)--June 24, 1999--
Long-time Customer Adds Titan II Systems to Extensive Ultratech Installed Base
Ultratech Stepper, Inc. (Nasdaq:UTEK), a leading supplier of photolithography systems used to manufacture semiconductors, micromachining devices and thin film heads (TFH) for disk drives, today announced a multi-million-dollar order for several Ultratech Titan II systems from a leading European semiconductor manufacturer, further solidifying the long-time relationship shared by both companies.
The Titan II machines -- Ultratech's high-resolution tools designed for gh-line mix-and-match and ASIC applications -- will replace the customer's Ultratech Model 1500 Machine Vision Systems (MVS) and will be used in the production of advanced power products.
"This significant order from a long-time European customer confirms Ultratech's leadership in providing cost-effective lithography systems to the semiconductor industry," said Joseph A. Nava, Ultratech's senior vice president, worldwide sales. "Our lengthy partnership has involved multiple migrations to new-generation technologies and our continued success with the customer is largely due to our seamless approach to these transitions."
Nava further commented on Ultratech's dedication to providing innovative cost-saving solutions to customers, noting the success of the company's application-specific lithography approach in combating the rising cost of leading-edge steppers. "The Titan II systems form an integral part of this strategy, which is designed to offer significant cost-saving advantages to our customers. As a result, we've seen our European installed base increase to include a substantial number of the advanced power semiconductor fabs on this continent," added Nava.
The Titan II system is a member of the Titan tool family that provides a series of sophisticated gh-line products for mix-and-match operations in more mature fabs or for use in packaging and micromachining/MEMS applications. Offering a resolution capability of 1.0 micron and a usable depth-of-focus of 3.0 microns, the Titan II system provides enhanced process latitude and easily adjusts to handle multiple wafer sizes.
The broadband gh-line illumination facilitates critical dimension control on thick films and the high wafer plane irradiance of greater than 1250 mW/cm sq. reduces exposure times and increases throughput. With its advanced Machine Vision System (MVS), a pattern recognition-based alignment system, the need for dedicated targets is eliminated and integration with existing processes is simplified.
"Safe Harbor" Statement under the Private Securities Litigation Reform Act of 1995: Certain of the statements contained herein may be considered forward-looking statements that involve risks and uncertainties, such as the cyclicality in the thin film head and semiconductor industries, competition, lengthy sales cycles for the company's systems, pricing pressures, the mix of products sold, delays, deferrals and cancellations of orders by customers, manufacturing inefficiencies and absorption levels, ability to volume-produce systems and meet customer requirements, dependence on new product introductions and commercial success of any new products, integration and development of the UltraBeam and Verdant operations, risks associated with introducing new technologies, inventory obsolescence, adjustments relating to the potential change in accounting for the ISI acquisition, the failure to develop and commercialize the ISI products, delays in collecting accounts receivable, extended payment terms, economic and political conditions in Asia and changes in technologies. Such risks and uncertainties are set forth in the company's SEC reports, including the company's Annual Report on Form 10-K for the period ended December 31, 1998 and its Form 10Q for the period ended March 31, 1999.
About Ultratech: Founded in 1979, Ultratech Stepper, Inc. designs, manufactures and markets photolithography equipment used worldwide in the fabrication of integrated circuits, micromachining devices, thin film heads for disk drives and photomasks for the semiconductor industry. The company produces products that substantially reduce the cost of ownership for manufacturers in the electronics industry. The company's home page on the World Wide Web is located at ultratech.com.
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CONTACT: Ultratech Stepper, Inc.
Laura Rebouche, 408/321-8835
lrebouchecorp.ultratech.com
or
MCA
Jane Evans-Ryan, 650/968-8900
jryanmcapr.com Today's News On The Net - Business Wire's full file on the Internet
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