Did SVGI just bury some lost orders in the following PRESS RELEASE???
Product development story sounds outstanding. Not only do they have the tool, but there's also a good photoresist to accompany it.
But why obscure the backlog information the way they did? It sounds like 5 less machines are in backlog, 3 of which were scheduled to ship last month???
Any other interpretations would be welcomed.
Ian.
The transition from 248 nm to 193 nm has been moved from the SIA's 180 nm node to 150 nm by the evolution of higher NA 248 nm systems. Several of the company's original 193 nm customers have either decided to use or are evaluating other 248 nm and 193 nm solutions. As a result of certain customers having decided that their product needs have changed beyond their original requirements for initial 193 nm machines, the company will reduce its total 193 nm orders received by $53 million. Of this amount, $32 million or three units will be reduced from the company's June 1999 backlog.
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Tuesday July 13, 7:00 pm Eastern Time
Company Press Release
SVG Announces Migration Path to Advanced 193 nm Scanning Technology: Company Reduces Backlog to Account for 193 nm Changes of Customers' Requirements
SAN FRANCISCO--(BUSINESS WIRE)--July 13, 1999--Silicon Valley Group (Nasdaq:SVGI - news) reinforced its leadership in advanced DUV lithography today by announcing the most advanced performance results to date for 193 DUV lithography production.
Demonstrating superior linewidth control performance in thick resist, using binary reticles at 130 nm and 140 nm exceeding SGV's current MS 193 product specification, SVG expects to provide an early migration path to production-worthy, next generation 193 very high NA products.
The results offer major production advantages to logic and ASIC producers, which are not available with conventional 248 nm systems. According to JSR Microelectronics, the performance data was obtained by using the MS193 scanner at resolutions of 140 nm and 130 nm, (grouped lines) using JSR resist at a thickness of 3,900 angstroms. Across the field of linewidth variation (AFLV) was between 6.5 nm and 7.0 nm 3 sigma when measured across the scanner's full field of 26 mm with 31 nm overlay demonstrated.
''JSR is extremely pleased with the results of these ongoing developments and our collaborative efforts with SVG,'' commented Nobu Koshiba, executive vice president of JSR Microelectronics, Inc. ''Our recent results, including our work with SVG's full field scanner, are proving to be a major enabler and highlight the benefits of 193 nm lithography. We believe that JSR photoresists used in conjunction with SVG's MS193 scanners will result in a production worthy process window with less than 300 nm pitch lithography without the need for phase shift mask technologies.''
As the transition to 150 nm and 130 nm technology nodes evolves, a 193 nm tool is essential at critical levels. End users that have already purchased 248 nm tools can still get a return on investment by reusing such tools for loose critical dimensions (CD) performance levels, while shifting to the 193 nm technology for sub critical and critical levels.
''The MS 193 can deliver the best CD control and overlay performance,'' noted John J. Shamaly, SVG's corporate vice president of marketing. ''It also addresses the challenges of the Semiconductor Industry Association's (SIA) Technology Roadmap with conventional binary reticles that enable greater depth of focus and process latitude than current 248 high NA systems,'' he added.
According to SVG, the first development program for 0.6 NA 193 nm tool started in mid 96, and was supported by several customers. Specifications were established at 180 nm and development challenges delayed the program. In order for the technology to progress, customers deployed mini-steppers from other suppliers, which produced less than favorable results. Additionally, refractive full field scanners were produced with earlier availability dates.
The transition from 248 nm to 193 nm has been moved from the SIA's 180 nm node to 150 nm by the evolution of higher NA 248 nm systems. Several of the company's original 193 nm customers have either decided to use or are evaluating other 248 nm and 193 nm solutions. As a result of certain customers having decided that their product needs have changed beyond their original requirements for initial 193 nm machines, the company will reduce its total 193 nm orders received by $53 million. Of this amount, $32 million or three units will be reduced from the company's June 1999 backlog.
''SVG continues to focus on 193 nm technology and we believe that it will be competitive and extendible to 100 nm. By working with resist suppliers on the process as demonstrated by our recent results, while developing a VHNA production-worthy 193 nm platform,'' said Shamaly.
The VHNA platform will directly address sub 130 nm technology. SVG's VHNA platform will also accommodate a 248 nm light source as well as next generation 157 nm lasers to enable the industry to cross the 100 nm threshold.
Silicon Valley Group (Nasdaq:SVGI - news) is a leading manufacturer of automated wafer processing equipment for the worldwide semiconductor industry. The company designs, manufactures and markets technically sophisticated equipment used in the primary stages of semiconductor manufacturing. Its products include photolithography exposure tools; photoresist processing equipment; oxidation, diffusion and low-pressure chemical vapor deposition processing systems; and precision optical components and systems. For more information, visit www.svg.com.
Important Disclaimer Statement:
The matters discussed in this news release, and in particular the comments of the Company's corporate vice president of marketing as well as those of the executive vice president of JSR Microelectronics, Inc. include forward looking statements that involve substantial risks and uncertainties including but not limited to the extension, availability and commercialization of both resist and product technologies, economic conditions, industry conditions, trade environment and other risks discussed more fully in filings by the Company with the Securities and Exchange Commission. Reference is made to the Company's most recent Forms 10K and 10Q, which detail such risk factors.
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Contact:
Silicon Valley Group
Werner Rust, 408/467-5949 (Company Contact)
rustw@svg.com
Nancy Szymanski, 408/467-5955 (Investor Relations)
szymansn@svg.com |
