Formerly About Advanced Micro Devices Message Board

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Politics : Formerly About Advanced Micro Devices

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To: Dan3 who wrote (72354)	9/19/1999 11:51:00 PM
From: Process Boy	Read Replies (1) of 1572556

dan3 - re: Chevyman posts I still find it hard to believe that an obvious problem of this nature took so long to figure out. Resist removal chemistries should have a huge selectivity factor relative to the film, in this case ILD. Blown contacts would be easily detected in cross section. Other parts of his post seem to infer something may have been eating out the tungsten plugs. This also would have been easily detected in cross section. Still a puzzle to me, which is OK. I don't believe this person is totally privy to the Engineering side of this thing, but he is obviously trying to understand the factors that are determining his organization's successes and failures. Probably a good employee; team player kind of guy. PB

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