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Technology Stocks : Intel Corporation (INTC)
INTC 35.53-1.1%Nov 14 9:30 AM EST
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To: THE WATSONYOUTH who wrote (92470)11/15/1999 1:03:00 PM
From: Saturn V  Read Replies (1) of 186894
 
Ref- Notched Gate Etch procedure

I have a hypothetical notch etching process which might work.

Intel uses Cobalt Silicide for the gate material. Assume that a thin layer of polysilicon is deposited as gate, followed by a thick layer of Cobalt Silicide. Now the etching is a two step process. First a standard anisotropic etch all the way down to the gate oxide.Now use an isotropic etch which etches polysilicon much more rapidly than it etches CoSi. This should give the desired etch profile, as the lateral removal of polysilicon gradually exposes more CoSi for etching.

The challenge with the above flow will be the process control needed to get the precise dimensional control of the notch.
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