KLA-Tencor to acquire Finle for lithography modeling, analysis capabilities
Semiconductor Business News
(02/01/00, 07:20:30 PM EDT)
SAN JOSE -- KLA-Tencor Corp. today announced plans to acquire Finle Technologies Inc., an Austin, Tex.-based supplier of lithography modeling and analysis software. The acquisition is expected to enhance KLA-Tencor's new PMC-Net yield information network with additional analysis and modeling capabilities for process module control in photolithography.
"The 0.13-micron node is a critical inflection point for the industry," said Gary Dickerson, chief operating officer at KLA-Tencor. "Since these design rules are well below the wavelength of light used for imaging, the ability to model and control the lithography process becomes as mission-critical as the imaging technology used."
San Jose-based KLA-Tencor did not release details of the acquisition agreement.
Once the purchase is completed, KLA-Tencor plans to combine Finle's lithography and analysis software with its own inspection and measurement technologies to prove semiconductor manufacturers with a closer correlation between in-line parametric data, lithography process modeling and device performance. Finle's modeling and data analysis software enables chip makers to speed development of advanced lithography processes required to develop and produce ICs 0.13-micron and smaller geometries, said the San Jose metrology supplier.
"As a result, our customers will be able to speed lithography technology transitions and achieve better parametric control over their lithography process modules," Dickerson said. "This, in turn, will help reduce their time to market, maximize their yields and increase lithography capital utilization." |
