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To: Demosthenes who wrote (1189)	2/29/2000 12:50:00 PM
From: Jim Oravetz	of 1305

IBM to disclose details of new photoresist for 0.10-micron processing By Jack Robertson, Semiconductor Business News Feb 25, 2000 (7:13 AM) URL: semibiznews.com EAST FISHKILL, N.Y. -- IBM Corp.'s Microelectronics Division will tell the SPIE Microlithography Conference next week in Santa Clara, Calif. that it has licensed JSR Inc. of Japan to produce a new photoresist capable of taking 248-nanometer exposure tools down to 0.10-micron processing. George Gombo, manager of lithography at East Fishkill, said the Japanese firm is expected to have the new resist on the market in the first half of this year. He said IBM is already using the material extensively in its own chip operations. The new resist uses bilayer imaging to extend the range of krypton fluoride (KrF) 248-nm tools. Gombo said it is a silicon-containing resist with high etch resistive and anti-reflective coating. He said the extreme 0.10-micron processing is for application-specific circuits, but can be used for both memory and logic chips. IBM will also provide more details at the SPIE meeting on its custom optics system that is part of the cooperative development with Nikon Inc. for a next-generation electron beam projection lithography system. Gombo said the new high-emissive optic system has a large numerical aperture (NA) up to 0.7 and supports a large area exposure for greater tool throughput. A second paper will describe the projection reduction exposure technique using variable immersive lenses. Gombo said this corrects a problem of electron-beam exposure systems in which the electron beam width passing through the mask is sometimes degraded by electron repulsion. The IBM optics minimize the electron interaction with the mask and allow undistorted exposure on the wafer. IBM will also provide the first details of e-beam mask developments coming from its joint venture with Photronics Inc. (see July 12, 1999 story). Gombo said initial research results on both membrane and stencil masks will be presented. Jim

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