Lam Research (LRCX, NASDAQ): To the Insiders Message Board

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Technology Stocks : Lam Research (LRCX, NASDAQ): To the Insiders

LRCX 147.16

+3.2%

9:52 AM EST

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To: FJB who wrote (4028)	3/15/2000 11:47:00 AM
From: Proud_Infidel	Read Replies (2) of 5867

LRCX Application for Patent: Method and apparatus for control of deposit build-up on an inner surface of a plasma processing chamber Abstract A method and apparatus for controlling deposit build-up on an interior surface of a dielectric member of a plasma processing chamber. The deposit build-up is controlled by selective ion bombardment of the inner surface by shifting location of a peak voltage amplitude of a voltage standing wave on an antenna such as a flat spiral coil of the plasma processing chamber. A region of high ion bombardment on the interior surface of the dielectric member is displaced by controlling the value of a termination capacitance over a range of values causing regions of low and high ion bombardment to move over the dielectric member in order to effect cleaning thereof. company.sleuth.com

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