From PR Newswire:
DUV Lithography for 130 nm Geometries and Below
The World's First 2500 Hz Repetition Rate Production DUV Laser
SAN DIEGO, April 3/PRNewswire/ -- Cymer, Inc. (Nasdaq: CYMI), the world's
leading supplier of excimer laser illumination sources essential for deep
ultraviolet (DUV) photolithography, today unveiled the latest addition to its
advanced lithography light source portfolio -- the ELS-6010. Operating at
2500 Hz, the ELS-6010 is the world's highest repetition rate KrF production
laser. Signaling Cymer's continued product leadership at the 248 nm
wavelength, the ELS-6010 will be a key enabler in the production of
next-generation devices with 130 nm (0.13 micron) and below design rules.
According to Pascal Didier, Cymer's senior vice president of worldwide
customer operations, the continued trend toward more complex semiconductors
needed to power the consumer electronics of today and tomorrow mandate
superior circuitry imaging capabilities at extremely short wavelengths. "The
ELS-6010 will allow chipmakers to keep pace in meeting the continuous demand
for smaller, faster, smarter semiconductors by providing the illumination
source essential in imaging the finer linewidths associated with these
powerful chips. Cymer's demonstrated technology expertise at the
248 nm wavelength, coupled with its comprehensive service and support
infrastructure that spans more than 35 locations worldwide, allows the company
to further entrench its position as both the industry's leading and preferred
supplier of advanced light source solutions," said Didier.
Based on the leading-edge ELS-6000, the ELS-6010 is designed to provide
full imaging capability for 200 mm and 300 mm lithography steppers and
scanners with >0.7 numerical aperture (NA) lens designs. The ELS-6010
delivers this higher level of spectral performance through a highly
line-narrowed bandwidth of less than or equal to 0.5 pm at full-width half
maximum (FWHM) and less than or equalto 1.4 pm at 95 percent energy integral
and provides a significant improvement in dose stability performance at less
than or equal to +/-0.35 percent.
The ELS-6010 incorporates numerous technological advances, including a new
high voltage power supply, laser discharge chamber and wavelength
stabilization module to become the world's highest repetition rate production
DUV laser. Compared to 2000 Hz lasers, the ELS-6010 2500 Hz delivers
25 percent more pulses in a single exposure, ultimately improving the energy
dose stability at the wafer for improved critical dimension (CD) control and
higher yield. Furthermore, with its improved thermal management, the ELS-6010
can deliver full 20-watt power at unlimited duty cycle.
Cymer executives will be available to discuss the benefits afforded by the
ELS-6010 at booth A3.174 during SEMICON Europa, held April 4 through April 6
at the New Munich Trade Fair Centre in Munich, Germany.
Cymer, Inc. is the world's leading supplier of excimer laser illumination
sources, the essential light source for deep ultraviolet (DUV)
photolithography systems. DUV lithography is a key enabling technology, which
has allowed the semiconductor industry to meet the exact specifications and
manufacturing requirements for volume production of today's advanced
semiconductor chips. Cymer recently announced the installation of its 1,000th
DUV laser in production at a chipmaker's fab. Further information on Cymer
may be obtained from the Company's SEC filings, the Internet at
cymer.com or by contacting the company directly.
SOURCE Cymer, Inc.
-0- 04/03/2000
/NOTE TO EDITORS: Photo available upon request/
/CONTACT: David Brandt, Sr. Director of Marketing, 858-385-7139, fax,
858-385-6035, or Terry Slavin, Director, Corp. Communications & IR,
858-385-5232, fax, 858-385-6090, both of Cymer, Inc.; or Marie Labrie of MCA,
650-968-8900, fax, 650-968-8990, for Cymer, Inc./
/Web site: cymer.com
(CYMI)
CO: Cymer, Inc.
ST: California
IN: CPR
SU: PDT
MR-DO
-- LAM007 --
6972 04/03/2000 09:00 EDT prnewswire.com |
