SI
SI
discoversearch

We've detected that you're using an ad content blocking browser plug-in or feature. Ads provide a critical source of revenue to the continued operation of Silicon Investor.  We ask that you disable ad blocking while on Silicon Investor in the best interests of our community.  If you are not using an ad blocker but are still receiving this message, make sure your browser's tracking protection is set to the 'standard' level.
Technology Stocks : General Lithography
 Public ReplyPrvt ReplyMark as Last ReadFilePrevious 10Next 10PreviousNext  
To: Jim Oravetz who wrote (1215)4/21/2000 4:34:00 PM
From: Artslaw   of 1305
 
I was actually at IRPS and saw Lucent's paper (among others). You should realize that this paper is talking about the reliability of the oxides--how long they will last--not necessarily the practicality (nor the manufacturability). What they do not address is that the gate leaks like a sieve, which makes design difficult because (1) it makes simulation more difficult and (2) the power goes way up, even with reduced power supplies. Don't get me wrong--these devices will quite likely be used in the future, but the point is that reliability might not be the ultimate limiter of device scaling.

On the other hand, there are tricks (like dual-gate devices) which allow you to use thicker oxides and still get the current gain (= faster devices) that you'd get from another generation of oxide thinning, thus also pushing out the "brick wall." I think Moore will be OK for a few more years. . .Or at least my options are banking on it.

Steve
Report TOU ViolationShare This Post
 Public ReplyPrvt ReplyMark as Last ReadFilePrevious 10Next 10PreviousNext  

HomeMailHotSubjectMarksPeopleMarksKeepersSettings
Terms Of UseContact UsCopyright/IP PolicyPrivacy PolicyAbout UsFAQAdvertise on SI
© 2025 Knight Sac Media.  Data provided by Twelve Data, Alpha Vantage, and CityFALCON News