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Technology Stocks : General Lithography
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To: Andrew Vance who wrote (1218)4/25/2000 7:28:00 PM
From: Katherine Derbyshire   of 1305
 
Based only on your post, Andrew, this sounds similar to the interferometric approaches that have been around for a while. Those methods have proven to be very useful for line-and-space test patterns, for example to test resists in advance of exposure tool availability. But the method is inherently difficult to adapt to device patterns.

Like I said, though, I haven't read the full paper and therefore can't be sure that I understand what they're doing.

Katherine
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