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A T M I Welcomes Sub-Atmospheric Gas Source Loss Prevention Guidelines
DANBURY, Conn.--(BUSINESS WIRE)--May 4, 2000--A T M I, Inc. (NASDAQ:ATMI), today announced that a leading insurance and property loss prevention research organization has published guidelines which suggest that sub-atmospheric dopant gas sources should be used in place of high-pressure cylinder sources wherever process compatibility will allow.
A T M I patented and pioneered sub-atmospheric gas storage and delivery for dopants and other gases to serve the semiconductor industry with its SDS(R) (Safe Delivery Source) and SAGE(R) (Sub-Atmospheric Gas Enhanced) Gas Source product lines. These A T M I products enable sub-atmospheric pressure delivery for semiconductor processing in keeping with the guidelines from this leading organization.
A T M I previously published a press release on April 25, 2000 which erroneously stated, "Factory Mutual Specifies A T M I Products as Preferred Gas Storage & Delivery Method" and may have implied that Factory Mutual Research, in its Property Loss Prevention Data Sheets, specifically endorsed A T M I's sub-atmospheric delivery systems. Neither Factory Mutual Research, nor FM Global, the insurance organization of which it is an affiliate of, endorses or specifies products specific to any company.
By using A T M I's novel "no-pressure" technology, industrial customers have realized dramatic risk reductions related to both property loss and personnel health. Independent studies confirm that the products also provide significant productivity and cost saving benefits. A T M I's sub-atmospheric gas sources also contribute additional customer benefits because of relaxed building and fire codes that reflect its inherent safety. This means shorter construction times, lower costs, and improved flexibility for hazardous process material storage and use.
Introduced in 1994, the semiconductor industry's broad acceptance of A T M I's SDS Gas Source technology for ion implantation created demand for additional sub-atmospheric gas delivery systems for previously hazardous high-pressure gases. A T M I introduced its second sub-atmospheric technology, SAGE - Sub-Atmospheric Gas Enhanced
- for chemical vapor deposition (CVD) chip production processes, in 1998. |
