rudedog,
Less then 0.1 micron resolution! This appears to be a big breakthrough. In you opinion, what will be the impact on Computer and semi business?
NW
Breakthrough Optical Lithography Tool For Sub-0.1 Micron Resolution
NEW TRIPOLI, Pa., Apr 25, 2000 (BUSINESS WIRE) -- A revolutionary optical
lithography tool for patterning of semiconductor devices with feature sizes less
than 0.1 micron resolution has been announced by Mulith Inc.
The tool is significantly less expensive than existing steppers and step-and
scan systems from equipment manufacturers such as Silicon Valley Group
Lithography (NasdaqNM:SVGI), Ultratech Stepper (NasdaqNM:UTEK), ASM Lithography
(NasdaqNM:ASML), Nikon, and Canon, which are priced upwards of $6 million for
sub-0.13 micron resolution at a wavelength of 193nm.
It completely eliminates the conventional optical systems of lenses, which cost
about $1,000,000 per unit, and are available from companies such as Tropel, and
excimer lasers from companies such as Cymer (NasdaqNM:CYMI), and Lambda Physik.
The ability to use optical lithography to sub 0.1 micron resolution eliminates
the need for non-proven advanced technologies, such as extreme ultraviolet
lithography (EUV), X-ray lithography (XRL), electron projection lithography
(EPL), and ion projection lithography (IPL), which are being endorsed by
numerous equipment and semiconductor companies companies such as Lucent
Technologies (NYSE:LU), Applied Materials (NasdaqNM:AMAT), Nikon, IBM
(NYSE:IBM), Intel (NasdaqNM:INTC), Motorola (NYSE:MOT), AMD (NYSE:AMD),
Infineon, Hitachi, and Toshiba
"With conventional lithographic tools on the market, the minimum feature size
that can be printed is limited by the wavelength of light used," notes Greyson
Gilson, President of Mulith Inc. "No such fundamental resolution limit exists
for the new technology."
In addition, the new technology offers substantially improved depth of image
field and image field size over conventional lithographic tools.
Eliminated also are the need for expensive resolution enhancement techniques
(RET) used for optical extensions. These include off-axis illumination (OAI),
phase shifting masks (PSM), and optical proximity correction (OPC), available
from photomask suppliers such as Photronics (NasdaqNM:PLAB) and DuPont
Photomasks (NasdaqNM:DPMI).
The technology is able to produce sub-0.1 micron resolution without the need for
expensive DUV resists, which are still in the R&D stage, particularly 193nm
resists. Using proven advanced I-line resist priced at $550/gal versus 248nm DUV
resist at $1,400/gal further reduces cost of ownership of the system.
Distributed via COMTEX.
Copyright (C) 2000 Business Wire. All rights reserved.
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