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Politics : Formerly About Advanced Micro Devices

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To: Mani1 who wrote (115470)6/11/2000 6:29:00 PM
From: FJB  Read Replies (1) of 1572208
 
Mani,

AMD's '99 analyst presentation indicates that the HiP6L process at Dresden has 100nm gate lengths. A couple of years ago, few people would have believed that is possible with 248nm technology, but now they are in high-volume manufacturing. It is plausible that ASML's 0.70NA KrF scanner with RETs can take them below 100nm.

The next big step would be an ArF scanner with a NA 0f 0.70 from ASML, in conjunction with 4kHz ArF lasers, and more robust 193nm resists. I think all three of these might come together in early 2001.

It would not be surprising to see AMD push the current tool set further than anticipated. That seems to be par for the course these days all due to RETs.
numeritech.com
photronics.com

Bob
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