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Technology Stocks : General Lithography
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To: Andrew Vance who wrote (306)5/12/1997 7:51:00 PM
From: Ritz   of 1305
 
Andrew:

An interesting article, culled from today's Electronic News:

"ALL TOGETHER NOW -- The lack of federal support for some advanced lithography R&D strikes fear in the hearts of so many for good reason. A three-day lithography seminar held by Sematech -a federal funding castaway itself- quantified the oft-discussed "lithography bottleneck." Sematech estimates the effort to bring to fore a viable lithography means for 0.13-micron line widths and below at the low, low price of $1B and the easy effort of 1500 man years, according to an attendee of the session last week in Dallas. "Obviously, no one can even begin to afford that," the attendee said, "not even any country attempting to support its semiconductor industry could afford that." But Sematech is attempting to at least narrow down the choice of which next generation lithography means will be the one that the worldwide semiconductor industry must throw its support behind: electron-beam, X-ray or extreme ultraviolet (EUV). The funny thing is Lucent Technologies likes E-beam, as it has been funding the Scalpel project for years; Intel is partial to EUV and is working on that with the Sandia and Livermore National Labs; and of course, IBM is rooting for X-ray. Sematech is going to pull everyone together in November to attempt to make the cut."

-Ritz
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