ATMI Introduces New Gas Delivery Technology
DANBURY, CT--(BUSINESS WIRE)--July 10, 2000--ATMI, Inc. (Nasdaq: ATMI), today announced that its patent on a new technology for reducing the risks associated with the storage and delivery of hazardous process materials has been allowed.
This technology has been incorporated in ATMI's VAC(tm) -- Vacuum Actuated Cylinder -- which extends the use of sub-atmospheric pressure and reduced super-atmospheric pressure delivery to pyrophoric, corrosive, and other hazardous gases used in CVD and etch processes in the semiconductor industry. ATMI is now sampling the product into several of these applications.
Productivity, environmental, safety, and health benefits of the technology can include...
- increased storage capacities resulting in fewer required cylinder
changes for enhanced tool uptime; - reduced potential release rates from inadvertent misconnection of
the cylinder or accidental damage to process gas piping; - reduced exhaust ventilation power and facility investment; - reduced gas panel maintenance and corrosion damage; - more rapid implementation of new process materials; depending upon the application.
Karl Olander, Vice-President of Product Integration, said, "ATMI's VAC technology, especially in combination with ATMI's reduced pressure module delivery system, represents a revolutionary approach to gas delivery with significant cost savings and ES&H and benefits for many applications. Controlled studies with silane have validated the reduced risk potential."
Dennis Brestovansky, Vice-President of Gas Product Operations, said, "The important benefits VAC brings to etch and CVD processes using highly corrosive and pyrophoric materials should allow us to expand the process gas market we serve with our innovative gas storage and delivery technologies." |
