July 20, 2000--Ultratech Stepper, Inc. (Nasdaq/NM:UTEK) today announced the settlement with Nikon Corporation of a patent lawsuit concerning Ultratech's patent no. 5,281,996, which relates to photolithography used in the manufacture of semiconductors.
The settlement occurred in April 2000 and terms of the settlement were not disclosed.
On February 29, 2000, in the U.S. District Court of Virginia, Ultratech filed patent infringement lawsuits against Nikon Corporation, Canon Corporation and ASM Lithography Holding, N. V. The litigation against Canon Corporation and ASM Lithography Holding, N. V. is ongoing.
Specifically, patent no. 5,281,996 concerns the use of step and scan refractive technology used in the fabrication of patterns down to 0.1 micron geometries.
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