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Technology Stocks : General Lithography

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To: Jim Oravetz who wrote (1246)	8/2/2000 8:04:33 AM
From: Jim Oravetz	Read Replies (1) of 1305

July 19 -- Avant! Corporation today announced the U.S. Patent and Trademark Office has awarded the company patent number 6,081,658 for "Proximity Correction System for Wafer Lithography." The invention covers algorithms for "fast convolution," the enabling technology underlying Avant!'s model based proximity correction and lithography verification tools. The patent also covers methods for model based proximity correction, for the generation of empirical behavior models from process CD data, and for generation of simulation results. chipcenter.com Jim

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