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Pastimes : Clown-Free Zone... sorry, no clowns allowed
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To: LLCF who wrote (21979)9/27/2000 12:27:39 AM
From: XBrit  Read Replies (3) of 436258
 
Did we ever even get to .15u widths and 300mm wafers???

And by the way. The sequence is .25u, .18u, .13u. It goes in factors of 1.414, or 2x in area density each generation.

.18u is now in volume production, using 248nm lithography.

Pilot production of .13u will begin from now thru early 2001, and will ramp up to volume at leading-edge fabs in 1st half 2001. This early production is constrained because it is forced to use the existing 248nm litho tools. This means that it will be sub-optimum in performance (typically 100nm Leff gates) and relatively expensive because of the maskmaking and yield problems caused by pushing the old litho tools to their limits.

Later in 2001, 193nm litho tools will become available, and then the .13u processes will become faster (70 nm Leff gates) and cheaper (higher yields, cheaper masks).

300mm wafer fabs will begin pilot operations during next year, and will not ramp up to volume until 2002-2003. The 300mm thing is a really big deal, it involves replacing every tool in the fab. Many of the required tools are simply not ready for prime time yet.

Superimposing this schedule on the likely progress of the world slowdown, we see that the 300mm transition may get pretty stretched out by an unforseen recession or two. The 0.13u rollout will probably be reasonably well underway in time to survive.

[we all have our areas of expertise :)]
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