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Politics : Formerly About Applied Materials

AMAT 301.11

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Jan 9 9:30 AM EST

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To: Proud_Infidel who wrote (42792)	2/28/2001 1:31:54 AM
From: Katherine Derbyshire	Read Replies (2) of 70976

>>EUV alpha tool is now operational, says Intel lithography director<< I think maybe the author needs to listen a little more closely. I was sitting in the same sessions. The Engineering Test Stand is indeed operational and exposing resist. But an "alpha tool" as most of the industry understands it would be recognizable as a production-oriented design. Among other things, the ETS can't yet expose enough area to cover a full chip, can't even approach the exposure dose required for production throughput, and has only the most rudimentary wafer and mask handling capabilities. It's a great step forward, but it's not an alpha tool. Nor did I hear any of the presenters from the EUV LLC claim that it was. Harrumph. Katherine

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