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The CMP situation is probably more complex than you imply. My understanding of CMP is that it consists of 2 stages, polishing and cleaning. SFAM, IPEC, and now AMAT clearly have better machines for the polishing stage of CMP. However, ONTK appears to have a supurb cleaning tool - apparently, AMAT, and perhaps others, uses the ONTK cleaner in their CMP (i.e., if the AMAT tool does well than ONTK does well). Now, ONTK is coming out with a new, 'complete' CMP tool that will do both polishing and cleaning. As to whether it will be superior/competitive/non-competitive, only the chip manufacturers can tell us. |
