Advanced Micro Devices - Moderated (AMD) Message Board

STOCKTALK

We've detected that you're using an ad content blocking browser plug-in or feature. Ads provide a critical source of revenue to the continued operation of Silicon Investor. We ask that you disable ad blocking while on Silicon Investor in the best interests of our community. If you are not using an ad blocker but are still receiving this message, make sure your browser's tracking protection is set to the 'standard' level.

Technology Stocks : Advanced Micro Devices - Moderated (AMD)

AMD 230.76

-4.1%

12:29 PM EST

Public Reply Prvt Reply Mark as Last Read File

Previous 10 Next 10 Previous Next

To: fyodor_ who wrote (37720)	4/29/2001 12:59:25 AM
From: Mani1	Read Replies (1) of 275872

fyo re <<Smaller than the wavelength of light, eh? ;-)>> Yes. The wave length of the light is the reason for all this fuss. Current 248 tools (wave length of 248 nm) does just fine at 250 or 180 nm lithography. But it can not do well at 130 so phase mask shift must be used. By shifting the mask, certain part of the wavelength is filtered. This trick work very well and extended the life span for visible light. But for .25 micron and below, DUV became the light source used by everyone. All current steppers from ASML, SVG, Nikon and Canon are 248 tools, few next generation tools have been shipped for process development. The next generation tools are have 193 nm light source for the itho. Robert Grutza knows a lot about this stuff. Mani

Report TOU Violation

Share This Post

Public Reply Prvt Reply Mark as Last Read File

Previous 10 Next 10 Previous Next