FSI International Teams With KLA-Tencor to Provide Integrated Metrology Solutions for 300-mm Microlithography Systems
MINNEAPOLIS--(BUSINESS WIRE)--July 16, 2001--FSI International (Nasdaq:FSII - news) today announced that it has entered into an agreement with San-Jose, Calif.-based KLA-Tencor Corp. (Nasdaq:KLAC - news) to develop integrated metrology capabilities for FSI's POLARIS® 3500 Microlithography Cluster platform--specifically designed for advanced 300-mm photoresist processing. These integrated capabilities will initially include monitoring of critical dimension uniformity and coating thickness uniformity, with future plans to add overlay measurement and macro defect inspection.
Representing the first such solution of its kind, the fully integrated lithography/metrology processing system will help chipmakers address a number of critical challenges at the sub-0.13-micron nodes. This includes meeting increasingly tight lithography process windows that mandate near-zero tolerance for the process excursions that can hinder performance and yields on current and future device generations.
FSI believes that the heightened process control concerns driven by today's deep sub-micron processes will be further magnified in 300-mm fabs, since the number of die at risk doubles with these larger diameter wafers. By integrating KLA-Tencor's metrology technology into its leading-edge photoresist equipment, FSI plans to provide its customers with accelerated, reliable and accurate feedback on lithography process conditions--enabling them to quickly correct process variances, thereby ensuring device performance while minimizing wafer scrap and yield loss.
``Global chipmakers face unprecedented challenges as they strive to successfully implement deep sub-wavelength lithography, especially in tandem with copper and 300-mm processes,'' stated Debborah Ahlgren, vice president of marketing for KLA-Tencor's Mercury Division. ``Innovative process control solutions are needed to help these customers speed up time to volume and time to market on these advanced technologies. By integrating our metrology capabilities into FSI's process tools, we can dramatically reduce the time needed to gather litho-cell process data and implement corrective action. In addition to improving litho cell performance, this will help chipmakers successfully accelerate lithography technology transitions--consistent with KLA-Tencor's charter to help customers stay ahead of accelerating product life cycles and new manufacturing requirements.''
``Lithography is the most critical process within the fab, as well as the most expensive,'' stated Larry Wagner, president of FSI's Microlithography Division. ``The impact of the lithography process on overall yield is enormous, making it imperative that chipmakers utilize the most sophisticated process tools and process control technologies to properly control their lithography cell. Any delay in collecting vital process data from each wafer lot increases our customers' exposure to yield losses, which they can't afford at 300-mm. The FSI POLARIS system, already a leader in CD control coupled with high throughput, delivers one of the industry's lowest litho-cell cost of ownership solutions. By integrating leading process control and yield management solutions from KLA-Tencor, the POLARIS system will also be able to provide the integrated metrology capabilities our customers need for their advanced microlithography applications.''
The POLARIS 3500 Microlithography Cluster extends the unique productivity benefits of the POLARIS Cluster platform to 300-mm wafer processing, and is the only 300-mm resist processing system built on a proven 200-mm platform. The tool is targeted at 0.13-micron design rule applications. With the industry's current shift to 300-mm chip production, the POLARIS 3500 system bridges the gap between the two wafer sizes by reducing both tool footprint and risk associated with the 300-mm yield learning curve. The POLARIS Cluster ranges in price from $2.0 million to $3.5 million depending on the model and its configuration.
KLA-Tencor is the world leader in yield management and process control solutions for semiconductor manufacturing and related industries. Headquartered in San Jose, Calif., the company has sales and service offices around the world. An S&P 500 company, KLA-Tencor is traded on the Nasdaq National Market under the symbol KLAC.
FSI International, Inc. is a leading global supplier of processing equipment used at key production steps to manufacture microelectronics, including semiconductor devices and thin film heads. The Company develops, manufactures, markets and supports products used in the technology areas of microlithography and surface conditioning. FSI International's customers include microelectronics manufacturers located throughout North America, Europe, Japan and the Asia-Pacific region.
FSI International maintains a Web site at fsi-intl.com. |
