Thanks for the informative response. I didn't even notice the general reference to step-and-scan because I was so amazed that this whole reticle swapping idea. . .
I couldn't find the patent number that has been used in previous lawsuits with ASML--that would be the easiest place to find the "real" step-and-scan patent, since it would either be that patent, or referenced in the patent.
Whatever the case, I ran across many interesting things in the process of looking for it. Here's a story on the development of step-and-scan by an SVGI engineer. No claims on owning the patent.
fabtech.org
Some references of interest from an IBM article, including one from the above author (Sewell):
C. Karatzas and J. D. Buckley, "Step-and-Scan: A Systems Overview of a New Lithography Tool," Proc. SPIE 1088, 424-433 (1989).
H. Sewell, "Step-and-Scan: The Maturing Technology," Proc. SPIE 2440, 49-60 (1995).
The authors of the oldest paper on Step-and-Scan (above) were from Perkin-Elmer (according to the SPIE webpage), which was ultimately acquired by SVG with the help of IBM. Now, who got the patents in the process? Probably SVG since they've sued in the past. . .
Interesting history of all the players with a decidedly Dutch (ASML) slant:
209.67.253.180
Anyway, enough of this, just thought I'd flood the thread with more links!
Regards,
Steve
(who used to teach lithography, but never had much knowledge of the actual patents involved!) |
