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To: Dan3 who wrote (141963)	8/20/2001 11:45:58 AM
From: semiconeng	Read Replies (1) of 186894

Somebody already used up a good part of the benefit of moving to .13 while still on .18, but maybe you should read up a little more on "notched gates" before you decide which of the two main Windows compatible processors that description is best applied to. So, I probably am reading this wrong, but it seems like you are suggesting that Notched Poly is being used at 0.13u. It's not. Notched Poly was a 0.18u technique only, and was not incorporated into intel's 0.13u Process. Also, the assertion that notched gates were hard to do may have been true for IBM, but it wasn't difficult for intel. You simply adjusted the Etchers recipe during the latter pat of the Poly Etch to change from an AnIsotropic (Straight Down) Etch to an Isotropic (All Direction) etch. But, as I said, it's all Moot Point. Notched Poly is ancient history. Not needed for 0.13u process.... At least not intel's. Semi

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