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Technology Stocks : General Lithography

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To: James Word who wrote (410)	6/24/1997 12:12:00 AM
From: John Wang	of 1305

James: I would like to add to your description of PSM. The conventional mask consists of optically transparent and opaque patterns that replicate the intended circuit pattern. On the other hand, PSM uses optical phase difference in different areas of the mask to create optical interference. Using the "phase grating" theory in optics, the resolution can be improved over the conventional mask with a fixed lithography tool. The advantage of the depth of focus is maintained because the wavelenth and numerical aperture of the stepper remains the same. It is true that cutting a phase shift mask is challenging because it is circuit pattern dependent. Regards John

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