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Technology Stocks : Semi Equipment Analysis

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Dec 10 4:00 PM EST

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To: The Ox who wrote (1233)	10/16/2001 1:05:01 AM
From: The Ox	Read Replies (1) of 95565

Lam Integrates Metrology Technology On CMP Tools Staff -- Electronic News, 10/15/2001 Lam Research Corp. today said it plans to integrate metrology technology from Santa Clara, Calif.-based Sensys Instruments on board Lam’s Teres chemical mechanical planarization (CMP) tools. The news follows Lam’s August announcement that it was integrating KLA-Tencor Corp. technology in its etch tools. Lam (nasdaq: LRCX) said work began more than a year ago to integrate Sensys’ CMS broadband optical metrology system on its CMP tools. Sensys’ dry in-line metrology system can take pre-CMP and post-polish/clean measurements at any number of specific die locations, complementing Teres in situ broadband optical endpoint detection (EPD) technology, according to Fremont, Calif.-based Lam. The CMS system incorporates a broadband ultraviolet technology and pattern recognition. Sensys’ software architecture provides easier implementation of run-to-run control of Teres, Lam said. Teres allows tuning of several key process parameters, including multi-zone radial profile tuning using an air bearing platen and the decoupling of down force and profile control. These capabilities enable the system to take advantage of integrated metrology data to make localized adjustments that improve yield without impacting planarity performance, according to Lam. Any required CMP rework can be completed while the wafer is still being handled by the Teres system, Lam said. The CMS integrated metrology option is available for both the 200mm and 300mm Teres systems.

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