Varian Semiconductor Wins Multiple 300mm Orders for VIISta ion Implanters
Also Chosen as a Supplier-of-Record for Single Wafer Implanters
GLOUCESTER, Mass.--(BUSINESS WIRE)--Nov. 6, 2001--Varian Semiconductor Equipment Associates, Inc. (Nasdaq: VSEA - news), the leading supplier of ion implantation systems, today announced that a major U.S. chipmaker has ordered a series of VIISta single wafer ion implanters for advanced 300mm integrated circuit manufacturing.
This multi-million dollar order highlights the broad acceptance of the VIISta platform in leading 300mm fabs worldwide.
``The major U.S. semiconductor manufacturer which placed this order has always been at the forefront of technology, leading the industry into new process applications,'' said Varian Semiconductor's chairman and chief executive officer, Richard Aurelio. ``We are pleased that this customer is developing leading edge processes enabled by our VIISta single wafer implanters to meet their 300mm production requirements.''
During the past year, Varian Semiconductor has been working closely with engineers at this chipmaker's fab to complete an extensive equipment selection and qualification process and to quantify the potential cost reduction opportunities provided by the VIISta platform. As a result of working with the single wafer VIISta 810 medium current and high tilt VIISta 80 high current systems, this chipmaker designated Varian Semiconductor as a supplier-of-record.
``Our customer reports that it pursued the best and most cost effective production technology available and after an extensive review of implanter options, has selected Varian Semiconductor's VIISta platform of implanters for its sub-130nm production requirements,'' said Ernest Godshalk, president and chief operating officer of Varian Semiconductor. ``The designation of supplier-of-record further illustrates our technology leadership in 300mm single wafer processing with the VIISta platform, and we look forward to working closely with our customer on future ion implant technologies.''
The VIISta platform of parallel beam, single wafer implanters covers the entire range of ion implantation requirements, from 200eV through 3.75 MeV. The benefits derived from the parallel beam systems center around the precise placement of dopants in the device structures. Each implanter in the platform offers specific advantages in terms of integrated circuit performance.
For high current, the VIISta 80 presents an opportunity to improve junction abruptness control and increase the drive current and processing speed. For medium current, the VIISta 810 provides exceptional control of the Vt and halo implants, improving the consistency of operating characteristics and yield across the wafer. For high energy, the VIISta 3000 provides additional accuracy in the placement of dopant species to enhance well-to-well isolation characteristics, reducing the size of the transistors and increasing the number of integrated circuits on the wafer. The VIISta 10 P2LAD ultra low energy ion implanter combines pulsed-plasma doping with the VIISta platform functionality to overcome the significant technical challenges posed by the requirements of low energy doping for ultra shallow junctions.
About Varian Semiconductor
Varian Semiconductor Equipment Associates is the leading producer of ion implantation equipment used in the manufacture of semiconductors. The company is headquartered in Gloucester, Massachusetts, and operates worldwide. Varian Semiconductor maintains a web site at www.vsea.com. The information contained in the company's web site is not incorporated by reference into this release, and the web site address is included in this release as an inactive textual reference only.
Note: This press release contains forward-looking statements for purposes of the safe harbor provisions under The Private Securities Litigation Reform Act of 1995. For this purpose, the statements concerning the company's expectations regarding the customer discussed in this release, market share and technology leadership, technological capabilities and benefits are forward-looking statements and any statements using the terms ``believes,'' ``anticipates,'' ``expects,'' ``plans,'' or similar expressions are forward-looking statements. There are a number of important risks and factors that could cause actual events to differ materially from those suggested or indicated by such forward-looking statements. These include, among others, volatility in the semiconductor equipment industry; economic conditions in general and as they affect the company's customers; significant fluctuations in the company's quarterly operating results; the impact of rapid technological change; the company's dependence on the development and introduction of new products; the company's concentration on ion implantation systems and related products; concentration in the company's customer base and lengthy sales cycles; the highly competitive market in which the company competes; risks of international sales; foreign currency risks; and general economic conditions; and other factors identified in the company's Annual Report on Form 10-K, and the most recent Quarterly Reports on Form 10-Q filed with the Securities and Exchange Commission. The company cannot guarantee any future results, levels of activity, performance or achievement. The company undertakes no obligation to update any of the forward-looking statements after the date of this press release. |
