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Technology Stocks : Intel Corporation (INTC)
INTC 36.44-1.1%3:43 PM EST
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To: milo_morai who wrote (149569)11/26/2001 12:54:35 PM
From: wanna_bmw  Read Replies (1) of 186894
 
Milo, Re: "Intel Corp. now will spin its own version, saying it will address circuit designers' gripes with SOI while retaining the technology's low-power, low-capacitance attributes. At the same time, the company has chosen a high-k gate dielectric to replace silicon dioxide, which many experts believe will become too thin to be effective below the 0.10-micron node.

Intel's decision to use silicon-on-insulator technology comes after five years of study and is considered a key step in reducing transistor leakage and voltages. By implementing its own brand of SOI with high-k gate dielectrics, the company claims it will be able to build transistors that operate at terahertz speeds within the decade, while keeping power consumption in check."

Thanks for proving that leakage effects are not problematic until devices reach below the .10u node.

wbmw
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