(COMTEX) B: Tegal Announces Three Joint Development Projects With Major B: Tegal Announces Three Joint Development Projects With Major Japanese Electronic Firms PETALUMA, Calif., Dec 3, 2001 (BUSINESS WIRE) -- Tegal Corporation (Nasdaq:TGAL) today announced that it has entered into three new joint development partnerships with major Japanese microelectronic firms. All of the partnership efforts target the manufacturing processes needed for next-generation, non-volatile memory technology -- especially for next-generation ferroelectric random access memory (FeRAM) and magnetic random access memory (MRAM) devices. "Tegal is the world's leading supplier of etch systems for the new materials needed to produce non-volatile memories. Tegal has worked for more than five years to develop the etch technologies utilized by our customers as they migrate towards production volumes of advanced non-volatile memory devices. These three joint partnerships with existing customers include expanded hardware and process development efforts aimed at accelerating the development of these key memory technologies," said Jim McKibben, vice president of worldwide marketing and sales for Tegal. Two of the partnerships are specifically designated to focus on third-generation FeRAM stack etch development efforts, which extends Tegal's patented HRe- (TM) source technology to address 0.25-micron and smaller cell features. A key component in this effort is the introduction of a new high-temperature processing capability with the HT ESC upgrade for Tegal's 6540 HRe- (TM) system. The HT ESC allows etch processing of advanced PZT and SBT FeRAM stacks with platinum and iridium electrodes at wafer temperatures from 150 degrees C to 500 degrees C. The third joint development program is in the area of next-generation MRAM devices, seen by industry experts as an exciting alternative to FeRAM for non-volatile memory technology. This effort centers on the recently announced delivery of the first Tegal 6550 Spectra* system for MRAM production. Tegal representatives will be available to discuss the partnerships during the SEMICON Japan 2001 tradeshow, being held December 5th through the 7th, 2001 at Makuhari Messe, Chiba, Japan. Customers and news media are invited to visit Tegal at booth No. 2-A404. About Tegal Corporation Tegal Corporation, headquartered in Petaluma, Calif., is a leading designer and manufacturer of plasma etch systems used in the production of opto-telecom devices, integrated circuits (ICs) and other related microelectronics devices. Etching is a key process and must be repeated multiple times in the production of these devices. Tegal markets and services its systems in all major IC-producing regions of the world. Tegal was recently granted its fifth VLSI Research, Inc Ten Best award in recognition of its superior customer support and service. More information is available on Tegal's Web site at www.tegal.com. Safe Harbor Statement Except for historical information, the matters discussed in this news release are forward-looking statements. Such forward-looking statements are subject to certain risks and uncertainties including, but not limited to the company's ability to successfully develop non-volatile memory technology for third-generation ferroelectric random access memory (FeRAM) and magnetic random access memory (MRAM) devices with its Japanese partners, industry conditions, economic conditions, acceptance of new technologies, the growth of the wireless market, as well as other risks set forth in the Company's periodic filings with the Securities and Exchange Commission. CONTACT: Tegal Corporation Jim McKibben, 707/763-5600 jmckibben@tegal.com or Loomis Group, Inc. Megan Goodson, 415/882-9494 goodsonm@loomisgroup.com URL: businesswire.com Today's News On The Net - Business Wire's full file on the Internet with Hyperlinks to your home page. Copyright (C) 2001 Business Wire. All rights reserved. -0- KEYWORD: CALIFORNIA JAPAN INTERNATIONAL ASIA PACIFIC INDUSTRY KEYWORD: COMPUTERS/ELECTRONICS HARDWARE MANUFACTURING PRODUCT SOURCE: Tegal Corporation *** end of story *** |