PRI rolls out critical-dimension control
software at Semicon Korea
Semiconductor Business News
(02/05/02 16:14 p.m. EST)
SEOUL-- During the Semicon Korea
trade show, PRI Automation Inc.
today introduced an advanced
process control program to monitor
process metrics and then
automatically adjust production
process inputs for higher yields in
critical-dimension (CD) fabrication
steps.
The advanced process control
application is the second released by
PRI Automation. The WaferState APC
for Litho CD program increases
throughput and device performance
by monitoring metrics and correcting
any imbalances from process inputs
that are impacting quality, said the
Billerica, Mass.-based company.
The new program automates what is
still today a manual process, said
Tony Mullins, director of PRI's APC
practice. "Most semiconductor
manufacturers today track process
results with charts and then
manually adjust process tools when
measurements fall outside desired ranges," Mullins said.
"WaferState APC for Litho CD allows them to get ahead of
that curve, and make adjustments before process results are
adversely affected.
"This can have a dramatic impact on device quality and
throughput," he added.
PRI said tests have demonstrated that the WaferState APC
Litho for CD program improves Cpk (a process capability
index measuring quality) by about 30%, which results in
higher yields. The program also can increase throughput by
10-to-25% when part of a control system for overlays, and
tests show typical device speeds are improved 8%, PRI said.
WaferState APC is based on PRI's patent-pending FabRunner
library of optimization-based algorithms for advanced
control. The first WaferState APC software was introduced
by PRI during Semicon Japan in December, targeting fab
productivity improvements of up to 25% |
