Intel has reportedly selected Nikon's line of 193-nm scanners for use in processing the "critical layers" in chips at the 90-nm (0.09-micron) node, according to BlackFin, an investment firm that follows the semiconductor market in Boston. Nikon's tools will be used to process Intel's 0.09-micron microprocessors, which are due out in early-2003, according to the report.
--Of course, there's nothing preventing intel from using the ASML tools for Non-Critical Layers. I believe intel has followed this multi-stepper strategy in the past.
Others were quick to point out that Intel may chose one or more 193-nm tool vendors in order to meet the different requirements within its various fabs. In the future, Intel may use 193-nm tools from Nikon as well as ASML and Canon, sources said.
--I'm not so sure I'd bet my life savings on any of the three. That being said, but I'd be least likely to bet on Canon, since it has had the least success with intel in the past.... Still.... ya never know. I've heard of intel buying equipment from vendors, when my response to the company's names have been..... Who?
The chip giant is developing its 90-nm process within its Fab D1C pilot-line production plant in Hillsboro, Ore., the report said. In that plant, Nikon has reportedly installed its 193-nm tool. The Japanese company is also expected to ship a tool within Intel's Fab 11x plant in Albuquerque, N.M. Intel is expected to move into full production in this 300-mm fab in early-2003
--That sounds like an awfully aggressive timetable, unless....... Things are going MUCH BETTER in D1C than has been speculated...
:-)
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