Maybe posted previously?
Intel picks Nikon over ASML for 193-nm tool order, says report
By Semiconductor Business News
Feb 15, 2002 (12:56 PM)
URL: siliconstrategies.com
SANTA CLARA, Calif. -- The rumors are running rampant that Intel Corp. has reportedly selected Nikon Corp. over ASML Holding N.V. in the first round of a huge 193-nm (argon-fluoride) lithography-tool order within the chip giant--at least according to a report being circulated by BlackFin Research Partners Inc.
Intel has reportedly selected Nikon's line of 193-nm scanners for use in processing the "critical layers" in chips at the 90-nm (0.09-micron) node, according to BlackFin, an investment firm that follows the semiconductor market in Boston. Nikon's tools will be used to process Intel's 0.09-micron microprocessors, which are due out in early-2003, according to the report.
The Santa Clara-based company chose the tools from Japan's Nikon over ASML's Twinscan line of 193-nm scanners, according to BlackFin. Sources also believe that Intel was evaluating tools from Japan's Canon Inc., but the competition in the first round was narrowed between Nikon and ASML of the Netherlands.
Intel, ASML, and Nikon declined comment on the report. But BlackFin Research also indicated that ASML and Canon are still not out of the running at Intel.
"The decision for the non-critical, mix and match tool set to complement the Nikon 193-nm stepper is still being evaluated between the Nikon NSJ [tool] and the ASML TwinScan 248-nm systems," according to the report. "The path of least resistance would favor the Nikon NSJ due to consistent lens field size and alignment scheme, but Intel is known not to rely on a sole vendor for the critical process steps," the report added.
Others were quick to point out that Intel may chose one or more 193-nm tool vendors in order to meet the different requirements within its various fabs. In the future, Intel may use 193-nm tools from Nikon as well as ASML and Canon, sources said.
As reported, after a recent snafu with its incumbent supplier of 193-nm lithography tools, Intel has begun evaluating and taken delivery of advanced scanners from all major suppliers: ASML, Canon, and Nikon, according to sources (see Dec. 21 story ).
Intel was originally supposed to use 193-nm scanners from ASML's Silicon Valley Group Inc. unit to process its 0.13-micron chips, according to sources. But plagued by chronic delays and a change of heart at Intel, SVG's Micrascan V 193-nm lithography system was discontinued by ASML, which said it will converge all 193-nm wavelength tool offerings onto a single platform--the company's dual-stage Twinscan system (see Nov. 27 story ).
In its current fabs, Intel is presently using SVG's older 248-nm tools for processing the company's Pentium III chips, based on 0.25- to 0.18-micron technologies, according to BlackFin.
Intel is also using Nikon's NSJ line of deep-UV tools for processing the critical layers for the company's 0.13-micron Pentium 4 microprocessors, the report said. It is also using Nikon's i-line tools for processing non-critical layers at 0.35-micron technologies.
The chip giant is developing its 90-nm process within its Fab D1C pilot-line production plant in Hillsboro, Ore., the report said. In that plant, Nikon has reportedly installed its 193-nm tool. The Japanese company is also expected to ship a tool within Intel's Fab 11x plant in Albuquerque, N.M. Intel is expected to move into full production in this 300-mm fab in early-2003. |
