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Technology Stocks : KLA-Tencor Corporation (KLAC)

KLAC 1,207

-1.6%

Nov 6 3:59 PM EST

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To: david jung who started this subject	2/21/2002 10:40:58 PM
From: SemiBull	Read Replies (1) of 1779

KLA-Tencor offers etch simulation with lithography modeling software SAN JOSE -- KLA-Tencor Corp. today announced the addition of an etch modeling and analysis module to its Prolith lithography simulation and modeling software to help users accelerate advanced photolithography process development. The company said the new module provides "better awareness and control" of the impact of lithographic changes on the quality of IC patterns etched into the wafer. The module is aimed at lithography process development and analysis of new materials, such as 193-nm photoresists, said KLA-Tencor. The company said traditional lithography simulation systems do not deal with the quality of patterns after etch processes. Once the etching step has been completed, critical-dimension (CD) errors cannot be changed, noted KLA-Tencor. The new software addresses the need to determine the impact of resist pattern on the quality of the final etched patterns. "With a single lithography cell in an advanced fab today valued in the tens of millions of dollars, our customers can't afford to have their CDs out of spec and risk significant yield losses," said Chris Mack, vice president of lithography technology at KLA-Tencor. KLA-Tencor said the software enables chip manufacturers to validate and rework their lithography processes to ensure successful production without sacrificing product wafers. The new etch software module enables Prolith to accurately predict the etch process for complex film stacks using one or more etch stages, said the company. The simulations include real-world etch effects such as undercutting, shadowing and tapering.

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