SemiOT:KLA Brings Web-based Process Monitoring to Litho Metrology Tools
Staff -- Electronic News, 2/28/2002
In anticipation of the SPIE Microlithography conference next week, KLA-Tencor Corp. today unveiled its Process Window Monitor (PWM) Series of critical dimension (CD) metrology systems designed for sub 0.13-micron processes.
The systems are based on KLA-Tencor’s CD scanning electron microscope (SEM) and optical CD metrology tools, and incorporates PWM technology. The new 8x50-PWM and SpectraCD-PWM systems include automated, web-based CD process window measurement, analysis and reporting capabilities.
"With 8x50-PWM and SpectraCD-PWM metrology systems, we can now perform process window qualification and control during the production of our most advanced flash memory products without any loss in lithography cell productivity," T.C. Wu, executive VP of technology at Atmel Corp. said in a statement.
The drift of lithography processes over time was tolerable with larger design rules, but with deep submicron designs, process drift can affect yields. The use of the PWM technology allows users to monitor and correct this drift before it affects yields, according to KLA-Tencor.
Chipmakers using PWM systems can quickly access the optimal focus and exposure settings for each lithography cell, in addition to the depth of focus and exposure latitude of each cell, KLA-Tencor said. The technology furthermore standardizes lithography cells; if one tool is taken off line, wafers can be redirected to another cell with similar process window characteristics.
Integration of KLA-Tencor’s Klarity ProDATA process window analysis software is also available for detailed engineering analysis of data processed by the 8x50-PWM and SpectraCD-PWM tools, the company said |
