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Technology Stocks : KLA-Tencor Corporation (KLAC)

KLAC 1,186

-1.8%

10:24 AM EST

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To: david jung who started this subject	3/6/2002 7:59:26 PM
From: SemiBull	of 1779

KLA-Tencor to ship software to simulate both lithography and etch processes URL: siliconstrategies.com SAN JOSE -- KLA-Tencor Corp. next month will begin shipping a new version of its lithography simulation software line that includes an etch modeling capability. The new Prolith version 7.2 software from KLA-Tencor combines the company's lithography simulation package with an etch modeling and analysis module in the same product. The software enables chip makers to achieve greater control over the entire pattern transfer process, by providing better awareness and control of the lithographic changes and patterns etched on an IC. The product also accelerate the development of the lithography process, as well as the adoption of new materials, such as 193-nm photoresists, said Chris Mack, vice president of technology within the Finle Technologies Business Unit at KLA-Tencor of San Jose. "We're aiming the product for the 180-nm node and below," Mack told SBN at the SPIE Microlithography conference in Santa Clara, Calif. earlier this week. KLA-Tencor's Prolith software determines the impact of the resist pattern on the quality of the final etched pattern--before committing product wafers to the etch process. This allows chip manufacturers to validate and rework their lithography processes to ensure successful production without sacrificing product wafers. The new etch software module enables Prolith to predict the etchprocess for complex film stacks using one or more etch stages. The etch simulations include real-world etch effects such as undercutting, shadowing and tapering. With the ability to take the etch process into account, lithography engineers can better understand how their process choices affect after-etch CDs, allowing them to verify the production worthiness of their lithography process.

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