Without mentioning Intel, Nikon says its 193-nm scanner made first 90-nm ICs
Semiconductor Business News
(03/20/02 17:47 p.m. EST)
BELMONT, Calif.--Without naming the chip maker, Nikon Precision Inc. today announced that its 193-nm and 248-nm scanners were used along with one of its i-line steppers to produce the industry's first fully functional ICs based on a 90-nm process technology.
The announcement comes just one week after Intel Corp. disclosed it had used a new 90-nm (0.09-micron) process technology to make the industry's first fully functional SRAM chips with a memory cells measuring only 1 micron2. Intel refused to identify the 193-nm step-and-scan exposure tool used to fabricate the prototype SRAMs on 300-mm wafers (see March 12 story).
Nikon officials in Belmont also refuse to identify the chip maker using its 193-nm NSR-305B scanner in making what the company said was the first functional chips using 90-nm processes. The chip maker--believed to be Intel by a number of sources--used a combination of the 193-nm argon-fluoride tool and Nikon's 248-nm krypton-fluoride (KrF) NSR204B scanner to produce the ICs. Nikon's NSR-SF100 i-line stepper was also used to handle non-critical layers in the device.
"By providing exposure tools with matching field size and throughput we allow our customers to configure the cost effective tool sets that are required to obtain the resolution and throughput necessary to be successful in this extremely competitive environment," said Frank Masciocchi, vice president of sales and marketing at Nikon's U.S. subsidiary in Belmont.
Nikon said the NSR-305B is its second-generation ArF scanner. THe 193-nm tool has a 0.68 numerical aperture (NA) and can process up to 78 twelve-inch (300-mm) wafers per hour, the company said. The NSR-204B is Nikon's fourth-generation KrF scanner. This 248-nm scanner a 0.68 NA lens and processes up to 80 twelve-inch wafers per hour. The NSR-SF100 "scan-field stepper" employs i-line illumination while matching the field size and throughput of the step-and-scan exposure systems, the Japanese lithography supplier said.
Intel's selection of 193-nm lithography systems has become closely guarded issue, but reports of Nikon winning the first round of competition have continued to surface despite the chip giant's denials. Last month, rumors were running rampant about Intel's selection of Nikon over ASML Holding N.V. in the first round of 193-nm competition. Intel has insisted that it has not close the door on the 193-nm competition, but a report from BlackFin Research Partners Inc. said Nikon had won the first orders (see Feb. 15 story).
Intel was originally planning to use 193-nm scanners from ASML's Silicon Valley Group unit, which was acquired by the Dutch lithography supplier last year. Intel decided that the SVG Micrascan V 193-nm tool wasn't ready for its 0.13-micron (130-nm) process, and opted to use 248-nm systems for critical dimensions in that technology generation. ASML decided to drop the Micrascan and converge all 193-nm wavelength systems onto a single platform--the company's dual-stage Twinscan system (see Nov. 27 story).
ASML is reportedly still in the running for a portion of Intel's huge 193-nm tool order for 90-nm processes, which will be fanned out into production fabs starting in 2003. Intel officials have insisted that the company could end up with two different vendors for its critical-dimension 193-nm scanners. Both ASML and Nikon are unwilling to discuss Intel's interest or testing of 193-nm systems for fear of being dropped by the Santa Clara, Calif.-base chip giant. |
