Rudolph Technologies Announces New Integrated Metrology Business Unit
FLANDERS, N.J.--(BUSINESS WIRE)--April 22, 2002--Rudolph Technologies (Nasdaq: RTEC - news)
Supplier of advanced metrologies for transparent and opaque films introduces modules for integrated measurements in real-time on process tools
Rudolph Technologies, Inc. (Nasdaq: RTEC - news), a leading supplier of film characterization metrology tools, announces the creation of a new business unit dedicated to integrated metrology and to producing a line of integrated metrology (IM) modules.
The newly developed line of IM products are targeted for yield and overall process improvement, generating substantial cost savings for semiconductor manufacturers and significant value added for process equipment suppliers. Drawing on its extensive background of producing advanced transparent and opaque metrology for in-line applications, the company is now preparing all of its core technologies for integration directly into process tools. As the only supplier of both transparent and opaque film metrologies used in high volume semiconductor production, Rudolph is uniquely positioned to pioneer the types of integrated metrology that will be needed according to projections outlined in the International Technology Roadmap for Semiconductors (ITRS).
``We see exciting opportunities for both IM technology and our new customers, the process equipment supplier. Integrated metrology will be an enabling technology for next generation semiconductor devices. Our transparent and metal metrology techniques are an excellent match for IM applications, providing valuable input into a process tool for tight feedback and feed-forward control of critical process parameters,'' says Rob Loiterman, Rudolph's new Senior Vice President of Technology and General Manager of Integrated Metrology. ``In addition, new technology being developed for our IM product line is complementary to our stand-alone metrology products. When used together, RTEC's IM and stand-alone products will provide both tight internal process tool control on targeted materials and high precision in-line quality control monitoring for a broad range of materials.'' Rudolph has formed strategic partnerships with several prominent Original Equipment Manufacturers (OEMs) and device manufacturers to identify critical process needs and to provide them with the best possible IM solutions. One of Rudolph's first IM modules characterizes ultra-thin films and advanced gate dielectrics on both monitor and product wafers. This business unit will continue to establish new partnerships and develop new solutions that will allow Rudolph to provide the highest performance and best value integrated metrology for:
Dielectric CMP
Barrier/seed deposition
Electroplated copper
Copper CMP
OCD for photoresist processing
OCD for etch
For more information on Rudolph or its integrated metrology products, contact Rudolph at 973-691-1300, or visit our Web site at www.rudolphtech.com.
Rudolph Technologies, Inc. is a worldwide leader in the design and manufacture of precision film metrology instruments for semiconductor markets. Founded in 1940, Rudolph has consistently proven its commitment to customers and new product innovation. In 1976, Rudolph introduced the semiconductor industry's first production-oriented, microprocessor-controlled automatic ellipsometer. In 1997, RTEC introduced its complete family of film metrology systems, including SpectraLASER(TM) and S200/300(TM) for meeting the transparent-film half and MetaPULSE® for meeting the opaque-film half of production film metrology requirements. Together they provide the industry's first true full-fab solution. Today, Rudolph's proprietary Laser Spectroscopic Ellipsometry(TM) and PULSE(TM) technologies and award-winning customer satisfaction ratings have made the company the acknowledged leader of high accuracy thin film metrology instruments supporting a wide variety of applications in the areas of diffusion, etch, CVD, and CMP. |
