Intel Orders ASML’s EUV Beta Tool
Online staff -- Electronic News, 4/22/2002
e-insite.net
Intel Corp. has placed an order for ASML’s extreme ultraviolet (EUV) lithography beta tool, which is scheduled to be delivered in the second half of 2005, the companies said today.
The beta tool will use 300mm wafers and will be initially designed for 45nm resolution capability. Santa Clara, Calif.-based Intel said the order demonstrates its committment to EUV technology, an extension of optical lithography that uses light with a wavelength of 13.5nm
"The sale of the first EUV beta tool is much more than the sale of a new tool to a customer. It represents the culmination of many years of work on the selection, development and engineering of next generation lithography technologies," said Martin van den Brink, ASML executive VP of marketing and technology. "Intel has confirmed its commitment to EUV and ASML’s EUV capability."
ASML, based in Veldhoven, Netherlands, has been a supplier to and licensee of the EUV Limited Liability Co., an organization of semiconductor manufacturers, since 1999. The organization counts Intel as a member. |
